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SMV-2015-15: Development of combined amplitude/phase photo masks
Horáček, Miroslav ; Kolařík, Vladimír ; Matějka, Milan ; Krátký, Stanislav ; Chlumská, Jana ; Meluzín, Petr ; Král, Stanislav
Research and development in the field of physical realization of transparent and opaque optical structures by means of electron beam lithography in a recording material supported by a glass substrate. The research covers the analysis of the graphical motive, its topology and morphology, research and application of binary and relief structures performing required graphical and optical properties, development of technology for the preparation of combined photo masks that process both the amplitude and the phase of the light beam, verification of optical properties of such masks.

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